Steven Hsiao

Title: Steven Hsiao: Innovator in Thin Film Technology

Introduction

Steven Hsiao is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of thin film technology, particularly through his innovative manufacturing methods. His work has led to advancements that enhance the performance of various electronic devices.

Latest Patents

Steven Hsiao holds a patent for a manufacturing method for a thin film with an anti-reflection rough surface. This invention provides a detailed process that begins with the formation of a thin film over a substrate. An amorphous silicon layer is then created over the thin film, followed by an in situ first annealing procedure that transforms the amorphous silicon layer into a polysilicon layer with an anti-reflection rough surface. A second annealing procedure is selectively performed, allowing the polysilicon layer to be doped through a gas-induced reaction. Ultimately, this process results in a poly film with an anti-reflection rough surface formed over the substrate.

Career Highlights

Steven Hsiao is currently employed at United Semiconductor Corporation, where he continues to develop and refine his innovative techniques. His expertise in thin film technology has positioned him as a valuable asset to the company and the industry at large.

Collaborations

Throughout his career, Steven has collaborated with notable colleagues, including Jacky Kuo and Mark Lin. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Steven Hsiao's contributions to thin film technology exemplify the spirit of innovation. His patent for a manufacturing method with an anti-reflection rough surface showcases his commitment to advancing the field. Through his work at United Semiconductor Corporation and collaborations with talented coworkers, he continues to make a significant impact in the industry.