This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignees: International Business Machines Corporation, Kabushiki Kaisha Toshiba, Siemens Aktiengesellschaft. Active years: 1998.
Company Filing History:



Years Active: 1998
Title: The Innovative Contributions of Steve Greco
Introduction
Steve Greco is a notable inventor based in LaGrangeville, NY (US). He has made significant contributions to the field of plasma processing, particularly in metal etching techniques. His innovative methods have the potential to enhance manufacturing processes in various industries.
Latest Patents
Steve Greco holds a patent for "Methods for metal etching with reduced sidewall build up during." This patent describes a method in a plasma processing chamber for etching through a selected portion of a layer stack. The layer stack comprises a metallization layer, a first barrier layer disposed adjacent to the metallization layer, and a photoresist layer disposed above the metallization layer. The method includes etching at least partially through the first barrier layer using a high sputter component etch. Additionally, it involves etching at least partially through the metallization layer using a low sputter component etch, which has a sputter component lower than that of the high sputter component etch. This innovative approach aims to improve the efficiency and quality of metal etching processes.
Career Highlights
Throughout his career, Steve Greco has worked with prominent companies such as Siemens Aktiengesellschaft and International Business Machines Corporation (IBM). His experience in these organizations has allowed him to develop and refine his expertise in plasma processing and etching technologies.
Collaborations
Steve has collaborated with notable professionals in his field, including Munir D Naeem and Stuart M Burns. These collaborations have contributed to the advancement of his research and the successful implementation of his innovative methods.
Conclusion
Steve Greco's contributions to the field of metal etching demonstrate his commitment to innovation and excellence. His patent and career achievements reflect his significant impact on the industry.