Tobyhanna, PA, United States of America

Stephen Meyer


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: **Stephen Meyer: Innovator in Photoresist Technology**

Introduction

Stephen Meyer is a distinguished inventor based in Tobyhanna, Pennsylvania. With a passion for innovation in materials science, he has made significant contributions to the field through his work at Clariant International Ltd. His expertise particularly shines in the development of photoresist compositions which are vital for imaging processes in various applications.

Latest Patents

Meyer holds a patent for a "Photoresist composition for imaging thick films." This invention focuses on a light-sensitive photoresist composition designed specifically for imaging thick films. The composition consists of a film-forming alkali-soluble resin, a photoactive compound, and a surfactant in a weight range of approximately 2000 ppm to 14,000 ppm. Notably, the photoresist film developed under this patent has a thickness exceeding 20 microns. Additionally, the invention outlines a novel process for coating and imaging this light-sensitive composition, demonstrating Meyer's commitment to advancing printing technologies.

Career Highlights

Throughout his career, Stephen Meyer has dedicated himself to pushing the boundaries of photoresist technology. His work has not only garnered him a patent but has also established him as a reputable figure within Clariant International Ltd. His relentless pursuit of innovation in this specialized field showcases his technical acumen and dedication to research and development.

Collaborations

Meyer has collaborated with esteemed coworkers, including Ralph R. Dammel and Mark A. Spak. Together, they have contributed to advancing the field of materials science and have played an instrumental role in the innovative direction of Clariant International Ltd. Their teamwork reflects the collaborative spirit essential for achieving breakthroughs in technology.

Conclusion

Stephen Meyer's contributions to the field of photoresist technology underscore the importance of innovative thinking in materials science. Through his patent and collaborative efforts at Clariant International Ltd, he continues to influence the industry positively. His work serves as an inspiration for aspiring inventors and established professionals alike, demonstrating that innovation thrives at the intersection of collaboration and expertise.

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