The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Mar. 21, 2003
Applicants:
Ralph R. Dammel, Flemington, NJ (US);
Stephen Meyer, Tobyhanna, PA (US);
Mark A. Spak, Edison, NJ (US);
Inventors:
Ralph R. Dammel, Flemington, NJ (US);
Stephen Meyer, Tobyhanna, PA (US);
Mark A. Spak, Edison, NJ (US);
Assignee:
Clariant International Ltd., Muttenz, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/023 ; G03F007/30 ;
U.S. Cl.
CPC ...
Abstract
The present invention relates to a light-sensitive photoresist composition especially useful for imaging thick films, comprising a film-forming alkali-soluble resin, a photoactive compound, and a surfactant at a level ranging from about 2000 ppm to about 14,000 ppm by weight of total photoresist. Preferably the photoresist film has a thickness greater than 20 microns. The invention further provides for a process for coating and imaging the light-sensitive composition of this invention.