Stephen C Chew

Title: The Innovations of Stephen C. Chew

Introduction

Stephen C. Chew is an accomplished inventor based in Dripping Springs, Texas. He has made significant contributions to the field of semiconductor technology, particularly in the development of Laterally Diffused Metal Oxide Semiconductor (LDMOS) transistors. With a total of 2 patents to his name, Chew continues to push the boundaries of innovation in his field.

Latest Patents

Chew's latest patents focus on the design and manufacturing methods of LDMOS transistors with implant alignment spacers. The first patent describes a LDMOS transistor that includes a gate stack comprising a first nitride layer formed on a silicon layer. This gate stack is separated from a substrate by a first oxide layer, and it features a polysilicon layer formed from the silicon layer. The second patent outlines a method for manufacturing this type of transistor, detailing the etching process of the gate stack and the implantation of the drain region with precise alignment.

Career Highlights

Stephen C. Chew is currently employed at NXP USA, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the performance and efficiency of electronic devices. Chew's innovative approach has garnered recognition within the industry, making him a valuable asset to his company.

Collaborations

Chew has collaborated with notable colleagues, including Hernan A. Rueda and Rodney Arlan Barksdale. These partnerships have contributed to the successful development of cutting-edge technologies in the semiconductor sector.

Conclusion

Stephen C. Chew's contributions to the field of semiconductor technology exemplify his commitment to innovation and excellence. His patents and collaborative efforts continue to shape the future of electronic devices.