This inventor holds 3 USPTO granted patents. Top assignee: Advanced Micro Devices Corporation. Active years: 1999-2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999-2001
Title: The Innovative Contributions of Stephanie Annette Grahn
Introduction
Stephanie Annette Grahn is a notable inventor based in Austin, TX (US). She has made significant contributions to the field of technology, particularly in the area of plasma etching processes. With a total of 3 patents to her name, her work has had a substantial impact on the industry.
Latest Patents
One of her latest patents is an "Apparatus and method for remote endpoint detection." This invention involves a chromator that monitors the endpoint of a plasma etching process from a remote location. The chromator is optically coupled to the plasma etching chamber via a fiber optic cable bundle, which includes specially designed brackets for optimal adjustment. This innovative method maximizes the likelihood of accurately detecting the endpoint of the etching process.
Another significant patent is the "Grounding mechanism which maintains a low resistance electrical ground path between a plate electrode and an etch chamber." This invention presents an etch apparatus that ensures a reliable electrical ground path despite temperature variations. The grounding mechanism is designed to contact both the plate electrode and the upper housing of the chamber, enhancing the efficiency and reliability of the etching process.
Career Highlights
Stephanie Grahn is currently associated with Advanced Micro Devices Corporation, where she continues to innovate and contribute to advancements in technology. Her work has been instrumental in improving processes and equipment used in the semiconductor industry.
Collaborations
Throughout her career, Stephanie has collaborated with talented individuals such as Toby J Winters and Michael Patrick McFee. These collaborations have further enriched her work and contributed to the success of her inventions.
Conclusion
Stephanie Annette Grahn is a remarkable inventor whose contributions to technology and plasma etching processes are noteworthy. Her innovative patents and collaborations reflect her dedication to advancing the field. Her work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile