Company Filing History:
Years Active: 2002-2013
Title: The Innovative Contributions of Stephane Dana
Introduction
Stephane Dana is a notable inventor based in Tel Aviv, Israel. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patents. With a total of 2 patents, Dana's work focuses on enhancing the efficiency and accuracy of photolithographic processes.
Latest Patents
Dana's latest patents include a "Track-based metrology method and apparatus" and an "AFM-based lithography metrology tool." The track-based metrology method involves a photolithographic track system designed for semiconductor wafer manufacture. This system features multiple stations for sequential processing of wafers, including a metrology station that checks if the processed wafer meets critical dimension tolerances. If the wafer is not within tolerance, it is sent to a stripping station for layer removal and returned for reprocessing. This innovative approach allows for adjustments in parameters to ensure optimal performance.
The AFM-based lithography metrology tool incorporates an Atomic Force Microscope (AFM) that measures overlay between masks and layers in inspected wafers. This tool generates precise overlay data, enhancing the accuracy of the photolithographic process. The integration of AFM technology into the track system represents a significant advancement in semiconductor manufacturing.
Career Highlights
Stephane Dana is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to collaborate with other experts in the field, furthering the development of innovative technologies.
Collaborations
One of Dana's notable collaborators is Joseph Bach. Their partnership has contributed to the advancement of photolithographic techniques and the overall efficiency of semiconductor manufacturing processes.
Conclusion
Stephane Dana's contributions to the field of semiconductor manufacturing through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry, paving the way for future innovations.