The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2002
Filed:
Jan. 12, 1999
Applicant:
Inventors:
Stephane Dana, Tel Aviv, IL;
Joseph Bach, Morgan Hill, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 1/316 ;
U.S. Cl.
CPC ...
G01N 1/316 ;
Abstract
A photolithographic track system for semiconductor wafer manufacture, that includes an Atomic Force Microscope (AFM), having a scanning stylus probe measurement device coupled to the AFM head, for measuring overlay between masks and layers in an inspected wafer, so as to generate overlay data. The AFM is situated in-track.