This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Stephan Van Reenen: Lithography Focus-Control Innovation
Introduction
Stephan Van Reenen is an inventor based in Eindhoven, the Netherlands. His work includes a patented method for determining focus actuation profiles in lithographic exposure apparatuses. He is associated with ASML Netherlands and has 1 patent listed in the provided information.
Latest Patents
Van Reenen’s patent, “Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus,” concerns controlling a lithographic exposure process across an exposure area with at least two topographical levels. The method determines a continuous, single focus actuation profile for those levels using an objective function with a component that optimizes a focus metric for each level.
Career Highlights
The patent reflects work on focus control in lithography, where maintaining suitable focus across different surface heights is important to the exposure process. Van Reenen is associated with ASML Netherlands, a company working in lithographic exposure technology.
Collaborations
The provided information identifies Simon Hendrik Celine Van Gorp as Van Reenen’s coworker. No further details about their specific collaboration are available.
Conclusion
Stephan Van Reenen’s listed patent addresses focus-profile determination for lithographic exposure across multiple topographical levels, highlighting a contribution to precision control in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile