Stella Y H Chen

Title: Stella Y H Chen: Innovator in Etching Speed Measurement

Introduction

Stella Y H Chen is a prominent inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of etching speed measurement, holding a total of 2 patents. Her work is instrumental in advancing technologies related to semiconductor manufacturing.

Latest Patents

Stella's latest patents include a "Structure for measuring the etching speed" and a "Method for measuring the etching speed." Both patents disclose a structure and method for measuring the etching speed through a test layer connected with several resistors. As the metal layer is etched, the resistors are disconnected from the circuit in order. The equivalent resistance of the sensing resistor system is measured to determine the etching speed. To account for errors in the resistors, her invention employs an IC layout technique that places an interdigitized dummy resistor beside the sensing resistors. By calculating the ratio of the equivalent resistance of the sensing resistors to the dummy resistor, the etching speed can be accurately computed.

Career Highlights

Stella Y H Chen is affiliated with the Industrial Technology Research Institute, where she continues to innovate and contribute to her field. Her expertise in etching speed measurement has positioned her as a key figure in semiconductor research and development.

Collaborations

Stella has collaborated with notable coworkers, including Jing-Hung Chiou and Kai-Hsiang Yen. Their combined efforts have furthered advancements in the technology surrounding etching processes.

Conclusion

Stella Y H Chen's contributions to the measurement of etching speed highlight her innovative spirit and dedication to advancing semiconductor technology. Her patents reflect her commitment to precision and accuracy in the field.