The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
Jun. 25, 2004
Jing-hung Chiou, Hsinchu, TW;
Kai-hsiang Yen, Hsinchu, TW;
Chin-horng Wang, Hsinchu, TW;
Chao-chiun Liang, Taichung, TW;
Stella Y. H. Chen, Hsinchu, TW;
Jing-Hung Chiou, Hsinchu, TW;
Kai-Hsiang Yen, Hsinchu, TW;
Chin-Horng Wang, Hsinchu, TW;
Chao-Chiun Liang, Taichung, TW;
Stella Y. H. Chen, Hsinchu, TW;
Industrial Technology Research Institute, Chu-Tung, Hsinchu, TW;
Abstract
The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.