Company Filing History:
Years Active: 2019-2024
Title: Steffen Steinert: Innovator in Photolithography Measurement
Introduction
Steffen Steinert is a notable inventor based in Jena, Germany. He has made significant contributions to the field of semiconductor lithography through his innovative methods and technologies. With a total of two patents to his name, Steinert's work is recognized for its impact on the precision and efficiency of photolithographic processes.
Latest Patents
Steffen Steinert's latest patents include a method for measuring photomasks and a method and apparatus for determining the position of structure elements of a photolithographic mask. The first patent focuses on a comprehensive method for measuring a photomask used in semiconductor lithography. The second patent outlines a systematic approach to determine the position of at least one structure element of a photolithographic mask. This method involves providing a reference image, deriving a data record with metadata, and optimizing the reference image by correlating it with measured images.
Career Highlights
Steffen Steinert is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and semiconductor manufacturing. His role at the company allows him to apply his expertise in photolithography and contribute to advancements in the industry.
Collaborations
Steffen collaborates with talented individuals such as Dmitry Simakov and Thomas Thaler. Their combined efforts enhance the innovative capabilities within their projects and contribute to the success of their endeavors.
Conclusion
Steffen Steinert's contributions to the field of photolithography measurement demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of semiconductor technology and its applications.