Steffen Rücker

Title: Steffen Rücker: Innovator in Photolithographic Exposure Control

Introduction

Steffen Rücker is a notable inventor based in Munich, Germany. He has made significant contributions to the field of photolithography, particularly in exposure control methods for manufacturing circuit boards. His innovative approach has led to advancements that enhance the precision and efficiency of photolithographic processes.

Latest Patents

Rücker holds a patent for his invention titled "Exposure control in photolithographic direct exposure methods for manufacturing circuit boards or circuits." This invention focuses on a device designed for exposure control in photolithographic direct exposure processes for two-dimensional structures in photosensitive coatings. The method involves converting registration data into direct exposure data, addressing the need for improved exposure control that allows for the registration of target marks independent of their defined locations. The invention utilizes a registration unit with multiple entocentric cameras arranged in linear alignment, creating a gapless linear scanning area over the substrate. This innovative design enables redundant image captures, allowing for precise calculations of target mark positions through triangulation.

Career Highlights

Steffen Rücker is associated with Laser Imaging Systems GmbH, where he applies his expertise in photolithography. His work has been instrumental in developing technologies that enhance the manufacturing processes of circuit boards. Rücker's dedication to innovation has positioned him as a key figure in his field.

Collaborations

Rücker collaborates with talented individuals such as Christian Schwarz and Jonas Burghoff. Their combined efforts contribute to the advancement of technologies in photolithography and related fields.

Conclusion

Steffen Rücker is a prominent inventor whose work in exposure control for photolithographic processes has made a significant impact on the manufacturing of circuit boards. His innovative solutions continue to shape the future of this technology.