Laser Imaging Systems Gmbh

Steffen Rücker

Stefan Heinemann

Uwe Klowsky

Jonas Burghoff

Holger Wagner

Marcus Witter

Christian Schwarz

Frank Jugel

Toni Strobel

Peter Vogt

René Pagel

Christian KÖNIG

The invention is directed to a device for exposure control in photolithographic direct exposure processes for two-dimensional structures in photosensitive coatings and to a method for converting registration data into direct exposure data. The object of the invention, to find an improved exposure control in direct exposure methods for two-dimensional structures in photosensitive layers which permits a registration of target marks independent from defined locations of the target marks, is met according to the invention in that a plurality of entocentric cameras are arranged in a registration unit () in linear alignment transverse to the one-dimensional movement of the substrate () to form a gapless linear scanning area () over a predetermined width of the substrate (). The angles of view of adjacent entocentric cameras have an overlapping region along the linear scanning area () in which redundant image captures of the substrate () of the adjacent cameras () are detectable, and the computing unit () has means for calculating the position of the target marks from the redundant image captures of the adjacent entocentric cameras additionally using a height position of the target marks which is determined by triangulation of a distance of the substrate surface ().

Exposure control in photolithographic direct exposure methods for manufacturing circuit boards or circuits

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Munich, Georgia

Steffen Rücker