Steffen Maisch

Title: Steffen Maisch: A Pioneer in Semiconductor Innovations

Introduction

Steffen Maisch is an innovative inventor based in Gerlingen, Germany. He is recognized for his significant contributions to the field of semiconductor technology, focusing on the formation of self-assembled monolayers.

Latest Patents

Steffen holds one patent titled "Compound used to form a self-assembled monolayer, layer structure, semiconductor component having a layer structure, and method for producing a layer structure." This patent describes a semiconductor component that consists of a gate electrode layer adjacent to a substrate and a gate dielectric layer adjacent to the gate electrode layer. Notably, the gate dielectric layer contains a monolayer of at least one compound with an aromatic or condensed aromatic molecular group, which can engage in π-π interactions that stabilize the monolayer. One specific application of this invention is in organic field effect transistors (OFETs). The manufacturing process for the monolayer is achieved through a liquid phase immersion technique.

Career Highlights

Steffen Maisch has made remarkable strides in his career, currently serving at Infineon Technologies AG. His work reflects a commitment to advancing semiconductor technology, focusing on improving the efficiency and stability of electronic components.

Collaborations

Throughout his career, Steffen has collaborated with several notable professionals in the field, including Guenter Schmid and Marcus Halik. These partnerships have significantly contributed to the development and realization of innovative semiconductor solutions.

Conclusion

Steffen Maisch stands out as a prominent inventor in the semiconductor domain. His patented inventions and collaborations signal a future ripe with advancements that could transform the way semiconductor components are designed and manufactured.