Munich, Germany

Stefan Simon

This inventor holds 1 USPTO granted patent. Top assignee: Micronas Gmbh. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Stefan Simon. Retrieved from https://idiyas.com/inventor/stefan-simon-u7hyls1r

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: The Innovations of Stefan Simon

Introduction

Stefan Simon is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology. His work focuses on developing advanced gas sensors that have practical applications in various industries.

Latest Patents

Stefan Simon holds a patent for a semiconductor gas sensor and a method for measuring a residual gas proportion with this sensor. The invention features a gas-sensitive gate electrode that is separated by a gap from a channel region. It is designed as a suspended gate field effect transistor or as a capacitor with a gas-sensitive layer made from a platinum/gold alloy. This innovative design allows for precise measurements of gas proportions, enhancing the functionality of gas sensors.

Career Highlights

Stefan Simon has dedicated his career to advancing semiconductor technology. He works at Micronas GmbH, where he continues to innovate and develop new technologies. His expertise in gas sensors has positioned him as a key figure in the industry.

Collaborations

Throughout his career, Stefan has collaborated with talented individuals such as Christoph Senft and Walter Hansch. These partnerships have contributed to the success of his projects and the advancement of semiconductor technology.

Conclusion

Stefan Simon's contributions to the field of semiconductor gas sensors demonstrate his innovative spirit and commitment to technological advancement. His work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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