Stefan Hölzig

Title: Innovations by Inventor Stefan Hölzig

Introduction

Stefan Hölzig is a notable inventor based in Freiberg, Germany. He has made significant contributions to the field of materials science, particularly in the development of processes for smoothening III-N substrates. With a total of 2 patents, his work has implications for various applications in semiconductor technology.

Latest Patents

Hölzig's latest patents focus on a process for preparing smoothened III-N substrates. This innovative process utilizes a smoothening agent comprising cubic boron nitride abrasive particles. The method allows for the production of large-sized III-N substrates or templates with diameters of at least 40 mm. The resulting substrates exhibit very low surface roughness across the entire surface, achieving a standard deviation of the rms-values of 5% or lower. The crystal quality of the surface is also notably high, measurable through techniques such as rocking curve mappings and micro-Raman mappings.

Career Highlights

Stefan Hölzig is associated with Freiberger Compound Materials GmbH, where he applies his expertise in materials science. His work has been instrumental in advancing the technology related to III-N substrates, which are crucial for various electronic and optoelectronic applications.

Collaborations

Hölzig collaborates with fellow researcher Gunnar Leibiger, contributing to the innovative projects at their company. Their combined efforts enhance the research and development capabilities within the field of compound materials.

Conclusion

Stefan Hölzig's contributions to the field of materials science, particularly through his patents on III-N substrates, highlight his role as an influential inventor. His work continues to pave the way for advancements in semiconductor technology.