Company Filing History:
Years Active: 2007-2010
Title: The Innovative Contributions of Stefan Brandl
Introduction
Stefan Brandl is a notable inventor based in Albany, NY (US), recognized for his significant contributions to semiconductor fabrication technologies. With a total of 4 patents to his name, Brandl has made strides in improving methods related to film coating and lithography processes.
Latest Patents
One of Brandl's latest patents is a "Method of spin coating a film of non-uniform thickness." This invention provides a technique for spin coating a film onto a substrate, allowing for a thickness gradient from the substrate's centrifugal center to its edge. The gradient can be linear or stepwise continuous, enhancing the precision of film application. Another significant patent is the "Method for reducing lithography pattern defects." This process focuses on removing contaminating particles from the wafer surface during semiconductor fabrication. It includes methods for repairing patterning defects caused by particles, ensuring higher quality in the final product.
Career Highlights
Stefan Brandl is currently employed at Infineon Technologies AG, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Brandl has collaborated with esteemed colleagues such as Yayi Wei and Francis Goodwin, contributing to a dynamic and innovative work environment.
Conclusion
Stefan Brandl's contributions to semiconductor fabrication through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and manufacturing processes.