This inventor holds 1 USPTO granted patent. Top assignee: National Research Development Corporation. Active years: 1989.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1989
Title: The Innovations of Stanley Affrossman
Introduction
Stanley Affrossman is a notable inventor based in Bearsden, GB. He has made significant contributions to the field of polymeric materials, particularly in their application as resists in integrated circuits. His innovative work has led to the development of a unique patent that enhances the performance of these materials.
Latest Patents
Affrossman holds a patent for "Polymeric materials and their use as resists." This invention involves polymeric materials that are useful as positive resists, comprising a backbone formed from an addition polymer that is degradable by radiation. The materials include at least three pendant polymeric groups that do not exhibit appreciable positive resist characteristics. The preferred backbone is a polymethacrylate ester, with three to five pendant polystyrene groups. These polymers demonstrate increased sensitivity and resistance to plasma processing, making them valuable components in integrated circuits.
Career Highlights
Affrossman is associated with the National Research Development Corporation, where he has been able to apply his expertise in polymer science. His work has been instrumental in advancing the technology used in electronic devices, particularly in the manufacturing of integrated circuits.
Collaborations
Throughout his career, Affrossman has collaborated with esteemed colleagues such as Massoud Bakhshaee and Richard A Pethrick. These partnerships have fostered a collaborative environment that has led to further innovations in the field of polymeric materials.
Conclusion
Stanley Affrossman is a distinguished inventor whose work in polymeric materials has significantly impacted the field of integrated circuits. His patent showcases his innovative approach to enhancing the performance of resists, contributing to advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
