The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 1989
Filed:
Jan. 19, 1988
Applicant:
Inventors:
Stanley Affrossman, Bearsden, GB;
Massoud Bakhshaee, Glasgow, GB;
Richard A Pethrick, Newlands, GB;
David C Sherrington, Lenzie, GB;
Assignee:
National Research Development Corporation, London, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ; C08F / ;
U.S. Cl.
CPC ...
525302 ; 525308 ; 430910 ;
Abstract
Polymeric materials useful as positive resists comprise a backbone formed from an addition polymer which is degradable by radiation and at least 3 pendant polymeric groups which show no appreciable positive resist characteristics. Preferably these materials comprise a backbone which is a polymethacrylate ester and from 3 to 5 pendant polystyrene groups. These polymers exhibit increased sensitivity and resistance to plasma processing and provide resists which are useful as components of integrated circuits.