David C Sherrington

Title: David C Sherrington: Innovator in Polymeric Materials

Introduction

David C Sherrington is a notable inventor based in Lenzie, GB. He has made significant contributions to the field of polymeric materials, particularly in their application as resists in integrated circuits. His innovative work has led to the development of materials that enhance the performance and efficiency of electronic devices.

Latest Patents

David C Sherrington holds a patent for "Polymeric materials and their use as resists." This patent describes polymeric materials that are useful as positive resists, comprising a backbone formed from an addition polymer that is degradable by radiation. The materials include at least three pendant polymeric groups that do not exhibit appreciable positive resist characteristics. The preferred backbone is a polymethacrylate ester, with three to five pendant polystyrene groups. These polymers demonstrate increased sensitivity and resistance to plasma processing, making them valuable components in integrated circuits.

Career Highlights

David C Sherrington is associated with the National Research Development Corporation, where he has contributed to various research initiatives. His work focuses on advancing the understanding and application of polymeric materials in technology.

Collaborations

David has collaborated with notable colleagues, including Stanley Affrossman and Massoud Bakhshaee. Their combined expertise has furthered research in the field of polymeric materials.

Conclusion

David C Sherrington's innovative work in polymeric materials has made a significant impact on the field of integrated circuits. His contributions continue to influence advancements in technology and materials science.