Glasgow, United Kingdom

Stanley Affrossman

This inventor holds 1 USPTO granted patent. Top assignee: Ekc Technology Inc.. Active years: 2006.


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Stanley Affrossman

Introduction

Stanley Affrossman is a notable inventor based in Glasgow, GB. He has made significant contributions to the field of materials science, particularly in the area of titanium corrosion inhibition. His work has led to the development of innovative solutions that address critical challenges in various industries.

Latest Patents

Affrossman holds a patent for the "Inhibition of titanium corrosion." This patent describes a composition for removing resist, polymeric material, and/or etching residue from a substrate comprising titanium or an alloy thereof. The composition includes hydroxylamine or a derivative thereof and at least one compound with a specific general formula. This invention is crucial for enhancing the durability and performance of titanium-based materials.

Career Highlights

Throughout his career, Affrossman has demonstrated a commitment to advancing technology and innovation. His work at Ekc Technology Inc. has positioned him as a key player in the field of corrosion prevention. With a focus on practical applications, he has contributed to the development of solutions that benefit various sectors.

Collaborations

Affrossman has collaborated with talented individuals such as Jerome Daviot and Douglas Holmes. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise, leading to groundbreaking advancements in their respective fields.

Conclusion

Stanley Affrossman's contributions to the field of titanium corrosion inhibition exemplify the impact of innovative thinking in technology. His patent and collaborative efforts highlight the importance of addressing material challenges in modern applications.

Profile summary based on public USPTO records.
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