Company Filing History:
Years Active: 2007-2010
Title: The Innovative Contributions of Stacey Cabral
Introduction
Stacey Cabral is a prominent inventor based in Richmond, VA (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of chemical mechanical polishing. With a total of 2 patents, her work has had a substantial impact on the industry.
Latest Patents
Stacey's latest patents focus on a process for post metal chemical mechanical polishing dry cleaning. This innovative method addresses the issue of metal residue on semiconductor surfaces that results from the chemical mechanical polishing (CMP) process. The dry cleaning technique she developed effectively removes or substantially eliminates this metal residue, thereby preventing unintended metal shorts that may occur due to the residue. By adjusting the dry cleaning process based on the type of cleaning material and the characteristics of the residue, her invention enhances the reliability of semiconductor devices.
Career Highlights
Throughout her career, Stacey has worked with notable companies in the semiconductor industry, including Qimonda AG and Infineon Technologies Richmond, LP. Her experience in these organizations has allowed her to refine her skills and contribute to advancements in semiconductor manufacturing processes.
Collaborations
Stacey has collaborated with esteemed colleagues such as Heinrich Ollendorf and Robert T. Fuller. These partnerships have fostered a creative environment that has led to innovative solutions in her field.
Conclusion
Stacey Cabral's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor in the industry. Her innovative approaches continue to shape the future of semiconductor manufacturing.