The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2007
Filed:
Feb. 11, 2004
Heinrich Ollendorf, Richmond, VA (US);
Stacey Cabral, Richmond, VA (US);
Robert Fuller, Mechanicsville, VA (US);
Heinrich Ollendorf, Richmond, VA (US);
Stacey Cabral, Richmond, VA (US);
Robert Fuller, Mechanicsville, VA (US);
Infineon Technologies Richmond, LP, Munich, DE;
Abstract
Metal residue on a semiconductor surface resulting from metal chemical mechanical polishing ('CMP') process are eradicated using a dry clean process. The dry cleaning uniformly removes or substantially eliminates metal residue from the surface of the semiconductor. An unintended metal short that may be present due to the residue may thereby be eliminated by adjusting the dry cleaning process based on a type of dry cleaning material, and type and a thickness of the residue.