Srinivasan Rangarajan

Title: Innovations of Srinivasan Rangarajan in Deposition Process Monitoring

Introduction

Srinivasan Rangarajan is an accomplished inventor based in Morgan Hill, California. He has made significant contributions to the field of deposition processes, particularly in the quantification of passivation and selectivity. His innovative approach has led to the development of a patented method that enhances the efficiency of selective deposition.

Latest Patents

Rangarajan holds a patent for a "Method and system for monitoring deposition process." This patent discloses a technique for quantifying passivation and selectivity during the deposition process. The method evaluates passivation by calculating film thicknesses on patterned lines and spaces. An X-ray photoelectron spectroscopy (XPS) signal is utilized, normalized with the X-ray flux number. This efficient method allows for the calculation of thickness in selective deposition processes, where thickness serves as a metric for measuring selectivity. The measured photoelectrons for each material can be expressed as a function of the thickness of the overlaying material, adjusted by material constants and effective attenuation lengths. In selective deposition over a patterned wafer, the expressions can be solved to determine both the intended and unintended deposition thicknesses over passivated patterns.

Career Highlights

Srinivasan Rangarajan is currently employed at Nova Measuring Instruments Ltd., where he continues to innovate in the field of measurement and deposition technologies. His work has been instrumental in advancing the understanding and application of selective deposition processes.

Collaborations

Rangarajan has collaborated with notable colleagues, including Heath A Pois and Laxmi Warad. Their combined expertise has contributed to the successful development and implementation of innovative solutions in the industry.

Conclusion

Srinivasan Rangarajan's contributions to the field of deposition process monitoring exemplify the impact of innovative thinking in technology. His patented methods not only enhance efficiency but also provide valuable metrics for measuring selectivity in deposition processes.