Company Filing History:
Years Active: 2022-2025
Title: Innovations by Srinivas Gandrothula
Introduction
Srinivas Gandrothula is a prominent inventor based in Santa Barbara, CA. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on methods that enhance the fabrication and performance of III-nitride semiconductor layers.
Latest Patents
One of his latest patents is titled "Method for flattening a surface on an epitaxial lateral growth layer." This method involves flattening a surface on an epitaxial lateral overgrowth layer, resulting in a smooth surface with island-like III-nitride semiconductor layers. The process includes stopping the growth of the ELO layers before they coalesce, followed by the removal of a growth restrict mask. This technique helps to minimize the supply of excess gases to the side facets of the semiconductor layers, ultimately leading to a smoother surface. Additionally, it prevents the compensation of a p-type layer by decomposed n-type dopants from the mask.
Another notable patent is the "Method of fabricating non-polar and semi-polar devices using epitaxial lateral overgrowth." This method describes the fabrication of a semiconductor device by forming a growth restrict mask on a III-nitride substrate. The substrate features an in-plane distribution of off-angle orientations, allowing for the growth of island-like III-nitride semiconductor layers that do not coalesce with neighboring layers. This innovation is crucial for advancing the capabilities of semiconductor devices.
Career Highlights
Srinivas Gandrothula is affiliated with the University of California, where he continues to push the boundaries of semiconductor research. His work has garnered attention for its potential applications in various electronic devices.
Collaborations
He has collaborated with notable colleagues, including Takeshi Kamikawa and Hongjian Li, contributing to the advancement of semiconductor technologies.
Conclusion
Srinivas Gandrothula's innovative methods in semiconductor fabrication highlight his expertise and commitment to advancing technology. His contributions are paving the way for future developments in the field.