Company Filing History:
Years Active: 1991-1999
Title: Spyridon Gisdakis: Innovator in Semiconductor Technology
Introduction
Spyridon Gisdakis is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative approaches have advanced the methods used in semiconductor fabrication and processing.
Latest Patents
Gisdakis's latest patents include a method for the implantation of dopants into semiconductor materials. This method involves conducting a reaction gas, such as fluorine, from a gas bottle through valves and a mass flow regulator into a recipient containing solid dopants. The reaction gas reacts with the dopant to form a gaseous chemical compound, which is then forwarded into an implantation apparatus. Additionally, he has developed a device for implementing a curing process at a semiconductor. This apparatus allows for the curing of semiconductor wafers, such as GaAs, in a reaction tube under a protective gas atmosphere. The process involves heating the reaction tube to a base temperature before exposing the semiconductor wafer to a curing temperature for a brief period.
Career Highlights
Spyridon Gisdakis is currently employed at Siemens Aktiengesellschaft, where he continues to innovate in the semiconductor field. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Throughout his career, Gisdakis has collaborated with several talented individuals, including Michaela Zellner and Joachim Hoepfner. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Spyridon Gisdakis is a prominent figure in semiconductor innovation, with a focus on improving implantation and curing processes. His contributions have had a lasting impact on the industry, showcasing the importance of continuous innovation in technology.