Hitachi, Japan

Sou Anzai


Average Co-Inventor Count = 4.5

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Ibaraki, JP (2011)
  • Mito, JP (2014)
  • Hitachi, JP (2010 - 2017)

Company Filing History:


Years Active: 2010-2017

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):

Title: Sou Anzai: Innovator in CMP Polishing Solutions

Introduction

Sou Anzai is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a total of 7 patents to his name, Anzai has focused on developing advanced polishing solutions that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Anzai's latest patents include a CMP polishing solution and polishing method. The CMP polishing liquid comprises a metal salt containing at least one type of metal selected from the group consisting of metals of Groups 8, 11, 12, and 13, 1,2,4-triazole, a phosphorus acid, an oxidizing agent, and abrasive grains. The polishing method involves polishing at least a palladium layer with an abrasive cloth while supplying the CMP polishing liquid between the palladium layer of a substrate and the abrasive cloth. Another notable patent is for a metal polishing slurry that contains abrasive grains, a metal-oxide-dissolving agent, and water. This slurry is designed to achieve a high polishing rate and excellent flatness of the polished surface, making it suitable for semiconductor devices.

Career Highlights

Sou Anzai is currently employed at Hitachi Chemical Company, Ltd., where he continues to innovate in the field of polishing solutions. His work has been instrumental in advancing the technology used in semiconductor manufacturing, contributing to improved reliability and cost-effectiveness.

Collaborations

Anzai has collaborated with notable coworkers such as Jin Amanokura and Takafumi Sakurada. Their combined expertise has further enhanced the development of innovative solutions in the semiconductor industry.

Conclusion

Sou Anzai's contributions to CMP polishing solutions and metal polishing slurries have made a significant impact on the semiconductor manufacturing industry. His innovative patents reflect his commitment to advancing technology and improving product quality.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…