This inventor holds 2 USPTO granted patents and 1 published patent application, plus 2 CIPO patents and 2 EPO patents. Top assignee: Snecma. Active years: 2009-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009-2011
Title: Sophie Costil: Innovator in Silicon Carbide Technology
Introduction
Sophie Costil is a prominent inventor based in Offemont, France. She has made significant contributions to the field of materials science, particularly in the development of methods for working with silicon carbide. With a total of 2 patents to her name, her work has garnered attention in both academic and industrial circles.
Latest Patents
Sophie Costil's latest patents include innovative methods that enhance the application of coatings on silicon carbide surfaces. One of her notable inventions is a method of making a deposit on an SiC-covered substrate. This invention outlines a process for depositing a coating on parts with silicon carbide surfaces, which involves several key steps. Additionally, she has developed a method for creating a device that measures deformation. This device features a first alumina coating applied through atmospheric thermal spraying onto the silicon carbide layer, along with a free filament strain gauge and an additional alumina coating.
Career Highlights
Sophie Costil is currently employed at Snecma, a company known for its expertise in aerospace propulsion systems. Her work at Snecma has allowed her to apply her innovative ideas in a practical setting, contributing to advancements in aerospace technology.
Collaborations
Throughout her career, Sophie has collaborated with esteemed colleagues such as Christian Coddet and Frederic Leman. These collaborations have further enriched her research and development efforts, leading to impactful innovations in her field.
Conclusion
Sophie Costil stands out as a dedicated inventor whose work in silicon carbide technology is paving the way for future advancements. Her contributions are not only significant in their technical merit but also in their potential applications across various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
