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Daejeon, South Korea

Sooyoung Hwang

This inventor holds 1 USPTO granted patent. Top assignees: Sk Geo Centric Co., Ltd., Sk Innovation Co., Ltd.. Active years: 2023.

USPTO Granted Patents = 1

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Company Filing History:

Sk Geo Centric Co., Ltd.

Sk Innovation Co., Ltd.

where one patent can have more than one assignee

Years Active: 2023

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1 patent (USPTO):Sort by Forward CitationsExplore Patents

1. 11725076 - Polymer for formation of resist underlayer film, composition for formation of resist underlayer film comprising same and method for manufacturing semiconductor element by using same (2023-08-15),

Profile summary based on public USPTO records.

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