This inventor holds 2 USPTO granted patents. Top assignee: Kwangwoon University Industry-Academic Collaboration Foundation. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Innovations by Soonchul Kwon in Facial Recognition Technology.
Introduction
Soonchul Kwon is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of facial recognition technology. His innovative work focuses on methods and apparatuses that enhance the accuracy and efficiency of face registration.
Latest Patents
Soonchul Kwon holds a patent for a method and apparatus for obtaining first and second images to detect first and second landmarks and face registration using 3D facial landmarks. This patent outlines a face registration method that includes obtaining first face image data and second face image data captured at different angles, sizes, or locations. The method involves detecting a first landmark for the first face image data and a second landmark for the second face image data. It also calculates the amount of movement and distance between the first and second landmarks, sets a plurality of reference landmarks based on this movement and distance, and matches the first and second landmarks by adjusting their position, angle, and size according to the reference landmarks. He has 1 patent to his name.
Career Highlights
Soonchul Kwon is affiliated with the Kwangwoon University Industry-Academic Collaboration Foundation. His role at this institution allows him to engage in research and development activities that bridge the gap between academia and industry.
Collaborations
He has collaborated with notable colleagues such as Seunghyun Lee and Hoijun Kim, contributing to advancements in their shared field of expertise.
Conclusion
Soonchul Kwon's innovative work in facial recognition technology exemplifies the impact of academic research on practical applications. His contributions continue to shape the future of this important field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile