Company Filing History:
Years Active: 2012-2013
Title: Innovations of Soon-Young Park in Semiconductor Technology
Introduction
Soon-Young Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on methods that enhance the fabrication and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is titled "Method for Fabricating Semiconductor Device." This method involves forming an insulation layer containing an impurity, etching the insulation layer to create a contact hole, treating the surface to decrease the impurity concentration, and rinsing the contact hole. Another significant patent is "Method for Forming Buried Word Line in Semiconductor Device." This method includes etching a pad layer and substrate to form a trench, filling the trench with a conductive layer, planarizing the conductive layer, performing an etch-back process, and conducting an annealing process in a nitride-based gas atmosphere.
Career Highlights
Soon-Young Park is currently employed at Hynix Semiconductor Inc., where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a valuable asset in the industry.
Collaborations
He has collaborated with notable coworkers, including Kee-Joon Oh and Sun-Hwan Hwang, who have also contributed to advancements in semiconductor technology.
Conclusion
Soon-Young Park's innovative work in semiconductor technology, particularly through his recent patents, showcases his commitment to advancing the field. His contributions are essential for the ongoing development of efficient semiconductor devices.