Daejeon, South Korea

Soon-Yeel Lee

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Lg Chem, Ltd. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Soon-Yeel Lee. Retrieved from https://idiyas.com/inventor/soon-yeel-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Soon-Yeel Lee

Introduction

Soon-Yeel Lee is a prominent inventor based in Daejeon, South Korea. He is known for his innovative work in the field of materials science, particularly in the development of privacy films. His contributions have significantly impacted the industry, showcasing his expertise and creativity.

Latest Patents

Soon-Yeel Lee holds a patent for a "Method for making privacy film." This method involves preparing a nickel mold with desired intagliated patterns, injecting a curable resin into the mold to create a master mold, and then using a UV curable resin to form a film with uneven patterns. The process is noted for its simplicity, excellent production efficiency, and low fabrication cost. He has 1 patent to his name.

Career Highlights

Lee is currently employed at LG Chem, Ltd., a leading chemical company in South Korea. His work at LG Chem has allowed him to explore and develop innovative solutions in materials technology. His dedication to research and development has positioned him as a key figure in his field.

Collaborations

Throughout his career, Soon-Yeel Lee has collaborated with notable colleagues, including Dong-wook Lee and In-Seok Hwang. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Soon-Yeel Lee's contributions to the field of materials science, particularly through his patent for privacy film, highlight his innovative spirit and commitment to advancing technology. His work continues to inspire others in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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