The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Dec. 29, 2009
Dong-wook Lee, Daejeon, KR;
Soon-yeel Lee, Daejeon, KR;
In-seok Hwang, Daejeon, KR;
Seung-heon Lee, Daejeon, KR;
Sang-ki Chun, Daejeon, KR;
Jie-hyun Seong, Daejeon, KR;
Dong-Wook Lee, Daejeon, KR;
Soon-Yeel Lee, Daejeon, KR;
In-Seok Hwang, Daejeon, KR;
Seung-Heon Lee, Daejeon, KR;
Sang-Ki Chun, Daejeon, KR;
Jie-Hyun Seong, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
Provided is a method for making a privacy film. In the method, a nickel mold having desired intagliated patterns are prepared, and a curable resin is then injected into the nickel mold to prepare a master mold. A UV curable resin is injected into the master mold, and then cured to thereby form a film where uneven patterns are formed. A black ink is injected into a concave portion of the film. The method provides advantages such as process simplicity, excellent production efficiency, and low fabrication cost.