Soon Sung Park

Title: Innovations of Soon Sung Park in Silicon Wafer Treatment

Introduction

Soon Sung Park is a notable inventor based in Chungnam, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the treatment of silicon wafers. With a total of two patents to his name, Park's work focuses on enhancing the integrity and yield of silicon wafers.

Latest Patents

One of Soon Sung Park's latest patents is a method of treating silicon wafers to improve intrinsic gettering and gate oxide integrity yield. This invention addresses the challenges faced during rapid thermal annealing in nitrogen-containing gas atmospheres, which can degrade the gate oxide integrity yield of silicon wafers. The method involves stripping the silicon nitride layer, followed by wafer oxidation and the subsequent removal of the silicon oxide layer. This innovative approach effectively restores the gate oxide integrity yield by mitigating the effects of crystal defects and vacancies generated during the annealing process.

Career Highlights

Soon Sung Park is currently employed at SunEdison Semiconductor Limited, where he continues to advance semiconductor technologies. His expertise in silicon wafer treatment has positioned him as a valuable asset in the industry.

Collaborations

Park has collaborated with notable colleagues, including Young Jung Lee and Jae-Woo Ryu, contributing to the development of innovative solutions in semiconductor processing.

Conclusion

Soon Sung Park's contributions to the field of semiconductor technology, particularly through his innovative patents, have made a significant impact on the industry. His work continues to enhance the performance and reliability of silicon wafers, showcasing the importance of innovation in technology.