This inventor holds 4 USPTO granted patents. Top assignee: Dongwoo Fine-Chem Co., Ltd.. Active years: 2023-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2023-2026
Title: Innovations of Soon-Hong Pang in Polymer Processing
Introduction
Soon-Hong Pang is a notable inventor based in Jeollabuk-do, South Korea. He has made significant contributions to the field of polymer processing, holding a total of 4 patents. His work focuses on developing solutions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Among his latest patents, one notable invention is a process solution for polymer processing. This solution contains a polar aprotic solvent, a fluorine-based compound, and a sulfur-containing compound. It is designed to have excellent storage stability and minimize damage to the metal layer while improving the ability to remove adhesive polymers from the circuit surface of semiconductor wafers. Another significant patent is a process solution composition for polymer treatment, which comprises a fluorine compound, a ketone solvent, and a polar aprotic solvent. This composition aims to prevent damage to various types of metals while enhancing the removal of adhesive polymers during semiconductor manufacturing.
Career Highlights
Soon-Hong Pang is currently associated with Dongwoo Fine-Chem Co., Ltd., where he continues to innovate in the field of polymer processing. His expertise and inventions have contributed to advancements in semiconductor technology, making processes more efficient and effective.
Collaborations
He has collaborated with talented coworkers, including Han-Byeol Kang and Tae-Hee Kim, to further enhance the development of innovative solutions in their field.
Conclusion
Soon-Hong Pang's contributions to polymer processing demonstrate his commitment to innovation and excellence in semiconductor manufacturing. His patents reflect a deep understanding of the challenges in the industry and provide effective solutions to overcome them.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile