Soo Ouk Jang

Title: **Inventor Soo Ouk Jang: Innovations in Plasma Technology**

Introduction

Soo Ouk Jang is an accomplished inventor based in Sejong, South Korea. With a focus on advancements in plasma technology, he holds two significant patents that showcase innovative techniques in semiconductor fabrication and material processing.

Latest Patents

One of Soo Ouk Jang's latest patents is titled "Point Etching Module Using Annular Surface Dielectric Barrier Discharge Apparatus and Method for Control Etching Profile of Point Etching Module." This invention presents a point etching module utilizing an annular surface-discharge plasma apparatus. The design features a plate-shaped dielectric along with a circular and an annular electrode that create a gas receiving space. The high-voltage power supply enables electric discharge, allowing the filament-type plasma to treat substrates effectively.

Another notable patent is the "Atomic Layer Polishing Method and Device Therefor." This method includes a process for scanning the surface of a specimen to measure peak sites and spraying gases containing specific elements to form a reaction gas layer. By projecting inert gas ions onto these sites, the method facilitates the separation of first atoms from the specimen, thus offering a refined polishing technique for various materials.

Career Highlights

Soo Ouk Jang works at the Korea Institute of Fusion Energy, an esteemed research institution that engages in cutting-edge fusion energy research. His contributions in plasma technology have significantly enhanced the efficiency of material treatment processes.

Collaborations

Throughout his career, Soo Ouk Jang has collaborated with several esteemed colleagues, including Dong Chan Seok and Yong Sup Choi. Together, they have worked on various projects that amplify the capabilities of plasma technology in industrial applications.

Conclusion

Soo Ouk Jang's innovative mindset and dedication to research have positioned him as a prominent figure in the field of plasma technology. His patents not only highlight his inventive spirit but also contribute to advancements in semiconductor processing, providing valuable tools for future developments in the industry.