Soo-ho Shin

Title: **Innovative Contributions of Soo-ho Shin**

Introduction

Soo-ho Shin, an accomplished inventor based in Hwaseong-si, South Korea, has made significant strides in the field of semiconductor technology. With a remarkable portfolio of 12 patents, Shin has contributed to advancements that aim to enhance the efficiency and performance of semiconductor devices.

Latest Patents

Among his latest innovations is a patent for a semiconductor device having vertical channels and a method of manufacturing it. This method is designed to prevent leakage current caused by gate electrodes intersecting element isolation layers in the active region of the device. By implementing vertical channels, the design provides a sufficient overlap margin, thus improving overall efficiency. The semiconductor device utilizes gate electrodes formed on element isolation layers, positioned higher than the active regions, effectively minimizing leakage current in the substrate. Furthermore, the gate electrodes employ a striped mask pattern, which ensures a better overlap margin than traditional contact or bar shape patterns.

Another noteworthy invention is a semiconductor device incorporating multiple bit lines that cross an active region on a substrate. This device features a contact pad located between adjacent bit lines, along with spacers positioned on the sidewalls of these bit lines. The design of the contact pad is such that its upper portion is situated between spacers, while its lower portion has a wider dimension than the space between the adjacent spacers, enhancing connectivity and performance.

Career Highlights

Soo-ho Shin is currently associated with Samsung Electronics Co., Ltd., where his expertise and innovative thinking contribute to the company's leadership in the semiconductor industry. His technological contributions not only reflect his commitment to advancing the field but also align with the company's mission to deliver cutting-edge electronics.

Collaborations

Throughout his career, Shin has worked alongside notable colleagues, including Yong-sung Kim and Tae-young Chung. These collaborations have resulted in enriched research and development efforts, further solidifying their roles as pivotal figures in the evolution of semiconductor technologies.

Conclusion

Soo-ho Shin represents the forefront of innovation in the semiconductor realm. His dedication to enhancing device efficiency and functionality positions him as a key player in the industry. As technology continues to evolve, Shin's work will undoubtedly leave a lasting impact on the future of semiconductor devices and their applications.