Hayward, CA, United States of America

Sonia Castillo

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sonia Castillo. Retrieved from https://idiyas.com/inventor/sonia-castillo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: **Innovative Contributions of Sonia Castillo in Semiconductor Processing**

Introduction

Sonia Castillo, an inventive mind located in Hayward, California, has made significant contributions to the field of semiconductor processing. With one patent to her name, her ingenuity is focused on enhancing the efficiency and durability of plasma chamber components used in semiconductor material processing.

Latest Patents

Sonia's remarkable patent, titled "Corrosion Resistant Aluminum Coating on Plasma Chamber Components," showcases her innovative approach to addressing critical challenges in semiconductor manufacturing. This patent details the development of components that feature at least one corrosion-resistant coating, which is a high purity metal coating formed through a cold-spray technique. This innovative coating process is essential for ensuring the longevity and reliability of various components such as chamber liners, electrostatic chucks, and gas distribution systems. Additionally, the inclusion of an anodized layer on the high purity metal coating provides added protection, further enhancing the performance of semiconductor processing equipment.

Career Highlights

Throughout her career, Sonia has worked diligently at Lam Research Corporation, a leader in semiconductor equipment manufacturing. Her work not only advances the technology but also contributes to the overall progress of the semiconductor industry. The development of corrosion-resistant coatings demonstrates her commitment to innovation and quality in engineering.

Collaborations

In her professional journey, Sonia has collaborated with esteemed colleagues such as John Edward Daugherty and Hong Shih. Together, they have contributed to significant advancements in the design and manufacturing of semiconductor processing components, highlighting the importance of teamwork in driving innovative solutions.

Conclusion

Sonia Castillo's groundbreaking work in semiconductor processing through her patent and collaborations emphasizes the critical role of innovation in the industry. Her contributions, particularly the development of corrosion-resistant aluminum coatings, reflect her dedication to enhancing the performance and reliability of semiconductor fabrication equipment. As technology continues to evolve, the impact of inventors like Sonia plays an essential role in shaping the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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