Song-Yi Lin

Title: Innovations of Song-Yi Lin

Introduction

Song-Yi Lin is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in photomask design and layout pattern formation. With a total of 4 patents to his name, Lin continues to push the boundaries of innovation in his industry.

Latest Patents

One of Lin's latest patents is titled "Method of forming a layout pattern and photomask." This method involves providing a layout pattern to a computer system, which includes a first pattern, a second pattern, and a third pattern. A central line defined by connecting a line end of the second pattern and a line end of the third pattern overlaps with a middle portion of the first pattern. The process includes performing optical proximity correction (OPC) on the layout pattern to create a first auxiliary pattern, which consists of a first stripe pattern and a second stripe pattern. The second stripe pattern is positioned closer to the first pattern than the first stripe pattern, with its extending length being less than that of the first stripe pattern. The layout pattern and the first auxiliary pattern are then outputted through the computer system onto a photomask.

Another significant patent is the "Photomask structure," which includes a layout pattern and at least one assist pattern. The layout pattern features corners, and the assist pattern wraps around at least one of these corners. A gap is maintained between the edge of the layout pattern and the assist pattern, enhancing the overall design.

Career Highlights

Song-Yi Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on advancing photomask technologies, which are crucial for the manufacturing of integrated circuits. Lin's innovative approaches have contributed to the efficiency and effectiveness of semiconductor production processes.

Collaborations

Lin collaborates with talented individuals in his field, including Chia-Chen Sun and En-Chiuan Liou. These partnerships foster a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Song-Yi Lin's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of photomask design and layout pattern formation.