Beaverton, OR, United States of America

Sonal Bhadauriya

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Lam Research Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sonal Bhadauriya. Retrieved from https://idiyas.com/inventor/sonal-bhadauriya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Sonal Bhadauriya: Innovator in Doped Hardmask Films

Introduction

Sonal Bhadauriya is a prominent inventor based in Beaverton, Oregon. She has made significant contributions to the field of materials science, particularly in the development of high selectivity doped hardmask films. Her innovative work has implications for various applications in semiconductor manufacturing.

Latest Patents

Sonal holds 1 patent for her invention titled "High Selectivity Doped Hardmask Films." This patent relates to high selectivity doped hardmask films, as well as methods of providing and using such films. The high selectivity doped hardmask film can be employed as a hardmask, an intermediate layer, or a coverage layer, showcasing its versatility in the industry.

Career Highlights

Sonal is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. Her role involves research and development, where she applies her expertise to create advanced materials that enhance manufacturing processes.

Collaborations

Throughout her career, Sonal has collaborated with notable colleagues, including Ragesh Puthenkovilakam and Kapu Sirish Reddy. These collaborations have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Sonal Bhadauriya's work in high selectivity doped hardmask films exemplifies her commitment to advancing technology in the semiconductor field. Her contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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