Lynn, MA, United States of America

Son T Chau

USPTO Granted Patents = 2 

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2020

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2 patents (USPTO):

Title: Innovations by Son T Chau in High Aspect Ratio Etching

Introduction

Son T Chau, an accomplished inventor based in Lynn, MA, has made significant contributions to the field of etching technology. With two patents to his name, Chau has developed cutting-edge methods that enhance processing performance, particularly in applications requiring high aspect ratios. His work demonstrates the intersection of innovation and practical application in materials science.

Latest Patents

Chau's latest patents showcase his novel approach to etching processes. The first patent, titled "Enhanced high aspect ratio etch performance using accelerated neutral beams derived from gas-cluster ion beams," describes a groundbreaking method for processing various features like trenches and vias. This method involves the use of an accelerated neutral beam derived from gas-cluster ion beams, enabling effective processing at the base of an opening with a high aspect ratio.

The second patent, "Film and methods of forming same," pertains to a novel technique involving an unmodified starting layer of material. This invention allows for the formation of a modified surface layer that is both efficient and sustainable, as it utilizes portions of the original material in creating the desired film properties.

Career Highlights

Son T Chau is currently affiliated with Exogenesis Corporation, a company known for its innovative solutions in the field of materials engineering. Throughout his career, Chau has focused on developing technologies that address complex challenges in etching and processing substrates.

Collaborations

Chau’s work at Exogenesis Corporation is complemented by his collaborations with notable colleagues, including Sean R Kirkpatrick and Kiet A Chau. This team dynamic fosters a collaborative environment that drives collective innovation and facilitates the advancement of their research initiatives.

Conclusion

Son T Chau is an influential figure in the realm of high aspect ratio etching technology. His patents reflect a dedication to advancing techniques that are both effective and transformative within his industry. Through his work at Exogenesis Corporation and collaborations with his coworkers, he continues to push the boundaries of innovation in materials processing.

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