Kawasaki, Japan

Soichiro Mitsui

USPTO Granted Patents = 7 

Average Co-Inventor Count = 2.1

ph-index = 4

Forward Citations = 27(Granted Patents)


Location History:

  • Kawasaki, JP (2005 - 2010)
  • Kanagawa, JP (2000 - 2014)

Company Filing History:


Years Active: 2000-2014

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7 patents (USPTO):Explore Patents

Title: Inventor Profile - Soichiro Mitsui

Introduction

Soichiro Mitsui, hailing from Kawasaki, Japan, is a notable inventor with a total of seven patents to his name. His innovative contributions primarily lie in the fields of substrate technologies and mask writing methods, showcasing his expertise in advanced fabrication processes essential for modern technology.

Latest Patents

Mitsui's latest patents include a unique substrate cover and a charged particle beam writing method that significantly enhance the efficiency of substrate processing. The substrate cover is designed with a conductive portion that corresponds to the peripheral edge region of the substrate, featuring transmissive portions that allow desired light to penetrate through. This patented design facilitates precise positioning and irradiation of the substrate edge with light, thereby optimizing the writing process.

Another notable patent details a method for generating writing pattern data for a reflective mask used with non-telecentric exposure tools. This method involves acquiring a vertical position profile of the blank mask substrate and calculating the unevenness of its surface. By determining shifts in image positions based on these measurements, Mitsui's innovative approach yields corrected writing pattern data essential for high-fidelity lithography processes.

Career Highlights

Throughout his distinguished career, Soichiro Mitsui has worked with renowned companies such as Kabushiki Kaisha Toshiba and Nuflare Technology, Inc. His tenure at these organizations has allowed him to contribute significantly to advancements in semiconductor manufacturing technologies, making his work influential in the industry.

Collaborations

Mitsui has collaborated with several esteemed professionals in the field, including Kiminobu Akeno and Toru Tojo. These collaborations have further enriched his projects, leading to innovative solutions and enhanced methodologies in substrate and mask technologies.

Conclusion

Soichiro Mitsui stands out as a prolific inventor whose patents reflect his innovative spirit and commitment to advancing technology. His contributions, particularly in substrate processing and lithography methods, continue to influence the semiconductor industry and pave the way for future advancements. With seven patents to his name, Mitsui's work exemplifies the vital role inventors play in driving progress and innovation.

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