Company Filing History:
Years Active: 2022
Title: Sivan Lifschitz: Innovator in Lithographic Mask Technology
Introduction
Sivan Lifschitz is a prominent inventor based in Rehovot, Israel. She has made significant contributions to the field of lithography, particularly in the development of systems and methods for generating comparable regions of a lithographic mask. Her innovative work has implications for die-to-die defect detection techniques, enhancing the precision and efficiency of semiconductor manufacturing.
Latest Patents
Sivan Lifschitz holds 1 patent for her invention titled "System and methods of generating comparable regions of a lithographic mask." This patent outlines methods for creating an in-die reference that aids in defect detection. The process involves identifying similar blocks of a lithographic mask based on CAD information, selecting a comparison distance, and aggregating these blocks to define comparable regions. The images of these regions are then acquired and compared using an inspection module, which is crucial for maintaining quality in semiconductor production.
Career Highlights
Sivan Lifschitz is currently employed at Applied Materials Israel Limited, where she continues to push the boundaries of innovation in lithographic technologies. Her work not only contributes to her company but also advances the broader field of semiconductor manufacturing.
Collaborations
Sivan has collaborated with notable colleagues, including Boaz Cohen and Gadi Greenberg. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies in her field.
Conclusion
Sivan Lifschitz is a trailblazer in the realm of lithographic mask technology, with her patent showcasing her innovative approach to defect detection in semiconductor manufacturing. Her contributions are vital to the ongoing advancements in this critical industry.