This inventor holds 2 USPTO granted patents. Top assignee: Disco Corporation. Active years: 2019.
Company Filing History:
Years Active: 2019
Title: Siry Milan - Innovator in Plasma Etching Technology
Introduction
Siry Milan is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma etching technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of wafer processing techniques.
Latest Patents
Siry Milan's latest patents include a plasma etching apparatus comprising a nozzle oscillating unit. This innovative apparatus features a vacuum chamber, a rotatable electrostatic chuck table for holding a workpiece, and a nozzle for supplying plasma etching gas. The nozzle oscillating unit allows for precise control of the nozzle's position, enabling it to move between the center and outer periphery of the electrostatic chuck table. Additionally, he has developed a method of processing a wafer that involves supplying an etching gas in a plasma state to remove processing strains and debris.
Career Highlights
Siry Milan is associated with Disco Corporation, where he continues to push the boundaries of plasma etching technology. His work has been instrumental in advancing the capabilities of wafer processing, making significant impacts in the semiconductor industry.
Collaborations
Some of Siry Milan's notable coworkers include Yoshio Watanabe and Hiroyuki Takahashi. Their collaborative efforts contribute to the innovative environment at Disco Corporation.
Conclusion
Siry Milan's contributions to plasma etching technology exemplify the spirit of innovation in the semiconductor industry. His patents and ongoing work continue to influence advancements in wafer processing techniques.