This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Tencent Technology (Shenzhen) Company Limited. Active years: 2022.
Company Filing History:
Years Active: 2022
Title: Sirui Gao: Innovator in Three-Dimensional Face Modeling
Introduction
Sirui Gao is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of three-dimensional face modeling. His innovative approach has led to the development of a unique method for configuring parameters of three-dimensional face models.
Latest Patents
Sirui Gao holds a patent for a "Parameter configuration method, apparatus, and device for three-dimensional face model, and storage medium." This application provides a method for configuring parameters of a three-dimensional face model. The method includes obtaining a reference face image, identifying a key facial point on the reference face image to obtain key point coordinates as reference coordinates, and determining a recommended parameter set in a face parameter value space according to the reference coordinates. The first projected coordinates are projected coordinates of the key facial point obtained by projecting a three-dimensional face model corresponding to the recommended parameter set onto a coordinate system. The proximity of the first projected coordinates to the reference coordinates meets a preset condition.
Career Highlights
Sirui Gao is associated with Tencent Technology (Shenzhen) Company Limited, where he continues to innovate and develop new technologies. His work focuses on enhancing the accuracy and efficiency of three-dimensional face modeling techniques.
Collaborations
Some of his notable coworkers include Mu Hu and Yonggen Ling, who contribute to the collaborative efforts in advancing the technology within the company.
Conclusion
Sirui Gao's contributions to three-dimensional face modeling demonstrate his innovative spirit and commitment to advancing technology in this field. His patent reflects a significant step forward in the configuration of face models, showcasing his expertise and dedication to innovation.