The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2022

Filed:

Feb. 26, 2021
Applicant:

Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;

Inventors:

Mu Hu, Shenzhen, CN;

Sirui Gao, Shenzhen, CN;

Yonggen Ling, Shenzhen, CN;

Yitong Wang, Shenzhen, CN;

Linchao Bao, Shenzhen, CN;

Wei Liu, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 19/00 (2011.01); G06T 19/20 (2011.01); G06K 9/62 (2022.01); G06T 17/20 (2006.01); G06V 40/16 (2022.01);
U.S. Cl.
CPC ...
G06T 19/20 (2013.01); G06K 9/6215 (2013.01); G06T 17/20 (2013.01); G06V 40/161 (2022.01); G06V 40/171 (2022.01); G06T 2219/2004 (2013.01);
Abstract

This application provides a method for configuring parameters of a three-dimensional face model. The method includes: obtaining a reference face image; identifying a key facial point on the reference face image to obtain key point coordinates as reference coordinates; and determining a recommended parameter set in a face parameter value space according to the reference coordinates. The first projected coordinates are projected coordinates of the key facial point obtained by projecting a three-dimensional face model corresponding to the recommended parameter set onto a coordinate system. The proximity of the first projected coordinates to the reference coordinates meets a preset condition.


Find Patent Forward Citations

Loading…