Company Filing History:
Years Active: 2022
Title: Mu Hu - Innovator in Three-Dimensional Face Modeling
Introduction
Mu Hu is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of three-dimensional face modeling. His innovative approach has led to the development of a unique parameter configuration method that enhances the accuracy and efficiency of face model creation.
Latest Patents
Mu Hu holds a patent for a "Parameter configuration method, apparatus, and device for three-dimensional face model, and storage medium." This application provides a method for configuring parameters of a three-dimensional face model. The method includes obtaining a reference face image, identifying a key facial point on the reference face image to obtain key point coordinates as reference coordinates, and determining a recommended parameter set in a face parameter value space according to the reference coordinates. The first projected coordinates are the projected coordinates of the key facial point obtained by projecting a three-dimensional face model corresponding to the recommended parameter set onto a coordinate system. The proximity of the first projected coordinates to the reference coordinates meets a preset condition.
Career Highlights
Mu Hu is currently employed at Tencent Technology (Shenzhen) Company Limited, where he continues to innovate and develop advanced technologies. His work focuses on improving the methods used in three-dimensional modeling, which has applications in various fields, including gaming, virtual reality, and facial recognition.
Collaborations
Mu Hu collaborates with talented individuals such as Sirui Gao and Yonggen Ling, who contribute to the innovative projects at Tencent. Their teamwork fosters a creative environment that drives technological advancements.
Conclusion
Mu Hu's contributions to three-dimensional face modeling exemplify the spirit of innovation in technology. His patent and ongoing work at Tencent Technology highlight the importance of advancements in this field.