Simon Rothenaicher

Title: Simon Rothenaicher: Inventor of Semiconductor Substrate Drying Devices.

Introduction

Simon Rothenaicher is an inventor based in Erlbach, Germany. His work includes patent inventions for drying disc-shaped semiconductor substrates. He is associated with Siltronic AG and has 3 patents.

Latest Patents

One of Rothenaicher’s latest patents describes a device for drying disc-shaped substrates. Its elongated body has a top surface, a bottom surface, and a circumferential surface. A hole in the top forms a channel that extends to a lower drainage part. The hole is chamfered to create a conical recess for resting a disc-shaped substrate. The chamfer angle is greater than 10° and less than 30°, while its depth is greater than 6 mm and less than 12 mm.

Another patent describes a drying device with an elongated body that tapers upward to form a wedge. The wedge’s two surfaces meet at an angle α and form an upper edge suitable for holding disc-shaped substrates. Multiple holes in the surfaces form channels that extend to a lower drainage part.

Career Highlights

Rothenaicher’s patent work focuses on device designs for drying semiconductor substrates. The described inventions use shaped supports and drainage channels to hold substrates and direct liquid away from them.

Collaborations

Rothenaicher is associated with Siltronic AG. His listed coworkers include Sebastian Geissler and Ludwig Lamprecht.

Conclusion

Simon Rothenaicher’s patents highlight practical approaches to semiconductor substrate drying through carefully shaped supports and integrated drainage channels.