Company Filing History:
Years Active: 2021-2023
Title: Silvan Meile: Innovator in Measurement Technology
Introduction
Silvan Meile is a prominent inventor based in St. Gallen, Switzerland. He has made significant contributions to the field of measurement technology, holding a total of 5 patents. His work focuses on enhancing the accuracy and efficiency of measurement processes, particularly through innovative software solutions.
Latest Patents
One of Silvan Meile's latest patents is titled "Dynamical modeling of CMMs for numerically correcting measurement results." This invention involves a computer program product designed to numerically correct the endpoint position of a Coordinate Measuring Machine (CMM). The program utilizes temporally resolved information from a set of sensors to compensate for errors between targeted and actual endpoint positions during measurement processes.
Another notable patent is "Oscillation analysis on an object produced by means of additive manufacturing." This method includes measuring the frequency-dependent natural oscillation behavior of an object by dynamically exciting it within a defined frequency range. The process also involves simulating the object's oscillation behavior through a virtual digital representation, allowing for a comprehensive analysis of the object's state.
Career Highlights
Silvan Meile is currently employed at Hexagon Technology Center GmbH, where he continues to develop innovative solutions in measurement technology. His expertise in the field has positioned him as a key player in advancing the capabilities of CMMs and additive manufacturing processes.
Collaborations
Throughout his career, Silvan has collaborated with notable colleagues, including Claudio Iseli and Asif Rana. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.
Conclusion
Silvan Meile's contributions to measurement technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of precision measurement and analysis.
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